Modeling of heterogeneous precipitation of iron in silicon

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dc.contributorAalto-yliopistofi
dc.contributorAalto Universityen
dc.contributor.authorHaarahiltunen, Antti
dc.contributor.authorVäinölä, Hele
dc.contributor.authorAnttila, O.
dc.contributor.authorSaarnilehto, Eero
dc.contributor.authorYli-Koski, Marko
dc.contributor.authorStorgårds, Jan
dc.contributor.authorSinkkonen, Juha
dc.contributor.departmentDepartment of Micro and Nanosciencesen
dc.contributor.departmentMikro- ja nanotekniikan laitosfi
dc.contributor.schoolSähkötekniikan korkeakoulufi
dc.contributor.schoolSchool of Electrical Engineeringen
dc.date.accessioned2015-04-09T09:00:49Z
dc.date.available2015-04-09T09:00:49Z
dc.date.issued2005
dc.description.abstractA model is presented for the growth and dissolution of iron precipitates at oxygen-related defects in silicon during thermal processing. The heterogeneous nucleation of iron is taken into account by special growth and dissolution rates, which are inserted into a set of modified chemical rate equations. This approach allows us to calculate the size distribution of iron precipitates and the residual iron concentration. By comparing the simulated results with experimental ones, it is proven that this model can be used to estimate the internal gettering efficiency of iron under a variety of processing conditions.en
dc.description.versionPeer revieweden
dc.format.extent3
dc.format.mimetypeapplication/pdfen
dc.identifier.citationHaarahiltunen, Antti & Väinölä, Hele & Anttila, O. & Saarnilehto, E. & Yli-Koski, Marko & Storgårds, Jan & Sinkkonen, Juha. 2005. Modeling of heterogeneous precipitation of iron in silicon. Applied Physics Letters. Vol. 87, Issue 15. 0003-6951 (printed). DOI: 10.1063/1.2099531.en
dc.identifier.doi10.1063/1.2099531
dc.identifier.issn0003-6951 (printed)
dc.identifier.urihttps://aaltodoc.aalto.fi/handle/123456789/15592
dc.identifier.urnURN:NBN:fi:aalto-201504082165
dc.language.isoenen
dc.publisherAIP Publishingen
dc.relation.ispartofseriesApplied Physics Lettersen
dc.relation.ispartofseriesVol. 87, Issue 15
dc.rightsCopyright 2005 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. http://scitation.aip.org/content/aip/journal/aplen
dc.rights.holderAmerican Institute of Physics
dc.subject.keywordiron precipitatesen
dc.subject.keywordiron concentrationen
dc.subject.keywordinternal getteringen
dc.subject.keywordgettering efficiencyen
dc.subject.keywordmodelingen
dc.subject.otherEnergyen
dc.subject.otherPhysicsen
dc.subject.otherElectrical engineeringen
dc.titleModeling of heterogeneous precipitation of iron in siliconen
dc.typeA1 Alkuperäisartikkeli tieteellisessä aikakauslehdessäfi
dc.type.dcmitypetexten
dc.type.versionFinal published versionen

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