Tantaaliyhdisteisiin perustuvat ohutkalvovastukset ja diffuusiovallit
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Helsinki University of Technology |
Diplomityö
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Instructions for the author
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Date
2001
Department
Major/Subject
Elektroniikan valmistustekniikka
Mcode
S-113
Degree programme
Language
fi
Pages
73
Series
Description
Supervisor
Kivilahti, JormaThesis advisor
Molarius, JyrkiKeywords
thin film resistor, ohutkalvovastus, diffusion barrier, diffuusiovalli, beta-Ta, beta-Ta, Ta2N, Ta2, TaN, TaN, TaC, TaC, sputtering, sputterointi, temperature coefficient of resistance (TCR), vastuksen lämpötilakerroin (TCR)