Atomic/molecular layer deposition: A direct gas-phase route to crystalline metal-organic framework thin films

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Volume Title

A1 Alkuperäisartikkeli tieteellisessä aikakauslehdessä

Date

2016

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Language

en

Pages

4
1139-1142

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CHEMICAL COMMUNICATIONS, Volume 52, issue 6

Abstract

Atomic/molecular layer deposition offers us an elegant way of fabricating crystalline copper(ii)terephthalate metal-organic framework (MOF) thin films on various substrate surfaces. The films are grown from two gaseous precursors with a digital atomic/molecular level control for the film thickness under relatively mild conditions in a simple and fast one-step process.

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Ahvenniemi, E & Karppinen, M 2016, ' Atomic/molecular layer deposition : A direct gas-phase route to crystalline metal-organic framework thin films ', Chemical Communications, vol. 52, no. 6, pp. 1139-1142 . https://doi.org/10.1039/c5cc08538a