Molecular vapor deposition in high-aspect-ratio microstructures

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URL

Journal Title

Journal ISSN

Volume Title

Kemian tekniikan korkeakoulu | Master's thesis

Authors

Date

2019-03-12

Department

Major/Subject

Functional Materials

Mcode

CHEM3025

Degree programme

Master's Programme in Chemical, Biochemical and Materials Engineering

Language

en

Pages

82

Series

Description

Supervisor

Franssila, Sami

Thesis advisor

Cura, Erkin

Keywords

molecular vapor deposition, high-aspect-ratio, dichlorodimethylsilane, quantitative nanomechanical mapping

Other note

Citation

Permanent link to this item

https://urn.fi/URN:NBN:fi:aalto-201903172273

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[dipl] Kemian tekniikan korkeakoulu / CHEM