Hardness, elastic modulus, and wear resistance of hafnium oxide-based films grown by atomic layer deposition

dc.contributorAalto-yliopistofi
dc.contributorAalto Universityen
dc.contributor.authorBerdova, Mariaen_US
dc.contributor.authorLiu, Xuwenen_US
dc.contributor.authorWiemer, Claudiaen_US
dc.contributor.authorLamperti, Alessioen_US
dc.contributor.authorTallarida, Graziaen_US
dc.contributor.authorCianci, Elenaen_US
dc.contributor.authorFanciulli, Marcoen_US
dc.contributor.authorFranssila, Samien_US
dc.contributor.departmentDepartment of Materials Science and Engineeringen
dc.contributor.departmentDepartment of Chemistry and Materials Scienceen
dc.contributor.organizationInstitute for Microelectronics and Microsystemsen_US
dc.contributor.organizationUniversita Degli Studi di Milano-Bicoccaen_US
dc.date.accessioned2018-08-01T13:35:09Z
dc.date.available2018-08-01T13:35:09Z
dc.date.issued2016-09-01en_US
dc.description.abstractThe investigation of mechanical properties of atomic layer deposition HfO2 films is important for implementing these layers in microdevices. The mechanical properties of films change as a function of composition and structure, which accordingly vary with deposition temperature and post-annealing. This work describes elastic modulus, hardness, and wear resistance of as-grown and annealed HfO2. From nanoindentation measurements, the elastic modulus and hardness remained relatively stable in the range of 163-165 GPa and 8.3-9.7 GPa as a function of deposition temperature. The annealing of HfO2 caused significant increase in hardness up to 14.4 GPa due to film crystallization and densification. The structural change also caused increase in the elastic modulus up to 197 GPa. Wear resistance did not change as a function of deposition temperature, but improved upon annealing.en
dc.description.versionPeer revieweden
dc.format.mimetypeapplication/pdfen_US
dc.identifier.citationBerdova, M, Liu, X, Wiemer, C, Lamperti, A, Tallarida, G, Cianci, E, Fanciulli, M & Franssila, S 2016, ' Hardness, elastic modulus, and wear resistance of hafnium oxide-based films grown by atomic layer deposition ', Journal of Vacuum Science and Technology A, vol. 34, no. 5, 051510 . https://doi.org/10.1116/1.4961113en
dc.identifier.doi10.1116/1.4961113en_US
dc.identifier.issn0734-2101
dc.identifier.issn1520-8559
dc.identifier.otherPURE UUID: db55bffc-aef8-4492-83c3-cd73ccfdd28een_US
dc.identifier.otherPURE ITEMURL: https://research.aalto.fi/en/publications/db55bffc-aef8-4492-83c3-cd73ccfdd28een_US
dc.identifier.otherPURE LINK: http://www.scopus.com/inward/record.url?scp=84983340642&partnerID=8YFLogxKen_US
dc.identifier.otherPURE FILEURL: https://research.aalto.fi/files/26703755/1.4961113.pdfen_US
dc.identifier.urihttps://aaltodoc.aalto.fi/handle/123456789/32929
dc.identifier.urnURN:NBN:fi:aalto-201808014330
dc.language.isoenen
dc.relation.ispartofseriesJOURNAL OF VACUUM SCIENCE AND TECHNOLOGY Aen
dc.relation.ispartofseriesVolume 34, issue 5en
dc.rightsopenAccessen
dc.titleHardness, elastic modulus, and wear resistance of hafnium oxide-based films grown by atomic layer depositionen
dc.typeA1 Alkuperäisartikkeli tieteellisessä aikakauslehdessäfi
dc.type.versionpublishedVersion

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