The so-called dry laser cleaning governed by humidity at the nanometer scale

Loading...
Thumbnail Image

Access rights

openAccess
publishedVersion

URL

Journal Title

Journal ISSN

Volume Title

A1 Alkuperäisartikkeli tieteellisessä aikakauslehdessä

Date

Major/Subject

Mcode

Degree programme

Language

en

Pages

3

Series

Applied Physics Letters, Volume 92, issue 3, pp. 1-3

Abstract

Illumination with single nanosecond pulses leads to the detachment of silica particles with 250nm radii from silicon surfaces. We identify two laser-energy dependent cleaning regimes by time-of-flight particle-scattering diagnostics. For the higher energies, the ejection of particles is produced by nanoscale ablation due to the laser field enhancement at the particle-surface interface. The damage-free regime at lower energy is shown to be governed by the residual water molecules, which are inevitably trapped on the materials. We discuss the great importance that the humidity plays on the cleaning force and on the adhesion in the experiments.

Description

Other note

Citation

Grojo, D, Delaporte, P, Sentis, M, Pakarinen, O H & Foster, A S 2008, 'The so-called dry laser cleaning governed by humidity at the nanometer scale', Applied Physics Letters, vol. 92, no. 3, 033108, pp. 1-3. https://doi.org/10.1063/1.2832766