Wafer-scale graphene quality assessment using micro four-point probe mapping

dc.contributorAalto-yliopistofi
dc.contributorAalto Universityen
dc.contributor.authorMackenzie, David M.A.
dc.contributor.authorKalhauge, Kristoffer G.
dc.contributor.authorWhelan, Patrick R.
dc.contributor.authorØstergaard, Frederik W.
dc.contributor.authorPasternak, Iwona
dc.contributor.authorStrupinski, Wlodek
dc.contributor.authorBøggild, Peter
dc.contributor.authorJepsen, Peter U.
dc.contributor.authorPetersen, Dirch H.
dc.contributor.departmentHarri Lipsanen Group
dc.contributor.departmentDanmarks Tekniske Universitet
dc.contributor.departmentCAPRES—A KLA Company
dc.contributor.departmentWarsaw University of Technology
dc.contributor.departmentENT SA
dc.contributor.departmentDepartment of Electronics and Nanoengineeringen
dc.date.accessioned2020-04-28T06:51:35Z
dc.date.available2020-04-28T06:51:35Z
dc.date.issued2020-05-29
dc.description| openaire: EC/H2020/785219/EU//GrapheneCore2
dc.description.abstractMicro four-point probes (M4PP) provide rapid and automated lithography-free transport properties of planar surfaces including two-dimensional materials. We perform sheet conductance wafer maps of graphene directly grown on a 100 mm diameter SiC wafer using a multiplexed seven-point probe with minor additional measurement time compared to a four-point probe. Comparing the results of three subprobes we find that compared to a single-probe result, our measurement yield increases from 72%-84% to 97%. The additional data allows for correlation analysis between adjacent subprobes, that must measure the same values in case the sample is uniform on the scale of the electrode pitch. We observe that the relative difference in measured sheet conductance between two adjacent subprobes increase in the transition between large and low conductance regions. We mapped sheet conductance of graphene as it changed over several weeks. Terahertz time-domain spectroscopy conductivity maps both before and after M4PP mapping showed no significant change due to M4PP measurement, with both methods showing the same qualitative changes over time.en
dc.description.versionPeer revieweden
dc.format.extent7
dc.format.mimetypeapplication/pdf
dc.identifier.citationMackenzie , D M A , Kalhauge , K G , Whelan , P R , Østergaard , F W , Pasternak , I , Strupinski , W , Bøggild , P , Jepsen , P U & Petersen , D H 2020 , ' Wafer-scale graphene quality assessment using micro four-point probe mapping ' , Nanotechnology , vol. 31 , no. 22 , 225709 . https://doi.org/10.1088/1361-6528/ab7677en
dc.identifier.doi10.1088/1361-6528/ab7677
dc.identifier.issn0957-4484
dc.identifier.issn1361-6528
dc.identifier.otherPURE UUID: 8f399276-2993-4726-a9e7-25e50e83c462
dc.identifier.otherPURE ITEMURL: https://research.aalto.fi/en/publications/8f399276-2993-4726-a9e7-25e50e83c462
dc.identifier.otherPURE LINK: http://www.scopus.com/inward/record.url?scp=85082095763&partnerID=8YFLogxK
dc.identifier.otherPURE FILEURL: https://research.aalto.fi/files/42140395/Mackenzie_2020_Nanotechnology_31_225709.pdf
dc.identifier.urihttps://aaltodoc.aalto.fi/handle/123456789/43891
dc.identifier.urnURN:NBN:fi:aalto-202306053551
dc.language.isoenen
dc.publisherIOP Publishing Ltd.
dc.relationinfo:eu-repo/grantAgreement/EC/H2020/785219/EU//GrapheneCore2
dc.relation.ispartofseriesNanotechnologyen
dc.relation.ispartofseriesVolume 31, issue 22en
dc.rightsopenAccessen
dc.titleWafer-scale graphene quality assessment using micro four-point probe mappingen
dc.typeA1 Alkuperäisartikkeli tieteellisessä aikakauslehdessäfi
dc.type.versionpublishedVersion
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