Ozone-based batch atomic layer deposited Al2O3 for effective surface passivation

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dc.contributorAalto-yliopistofi
dc.contributorAalto Universityen
dc.contributor.authorvon Gastrow, Guillaume
dc.contributor.authorLi, Shuo
dc.contributor.authorRepo, Päivikki
dc.contributor.authorBao, Yameng
dc.contributor.authorPutkonen, Matti
dc.contributor.authorSavin, Hele
dc.contributor.departmentVTT Technical Research Centre of Finland
dc.contributor.departmentHele Savin Group
dc.contributor.departmentDepartment of Micro and Nanosciencesen
dc.date.accessioned2017-05-11T07:16:26Z
dc.date.available2017-05-11T07:16:26Z
dc.date.issued2013
dc.description.abstractIn this paper we compare water and ozone as oxidants in the Al2O3 ALD reaction in terms of surface passivation quality. The experiments show that O3 produces a high negative charge density up to 7-1012 cm−2 even in as-deposited film, which is different from water based Al2O3 that requires a separate annealing step to activate the negative charge. In general, the ozone process produces lower interface defect density (Dit) and higher negative charge density, which contributes to the higher lifetime value than corresponding water process. Most importantly, ozone-based Al2O3 shows much better firing stability than water-based Al2O3. Ozone concentration is also shown to play a role in the surface passivation quality. Finally, we found out that inserting a water pulse after the ozone pulse can lower the Dit further resulting in even higher lifetime.en
dc.description.versionPeer revieweden
dc.format.extent890-894
dc.format.mimetypeapplication/pdf
dc.identifier.citationvon Gastrow , G , Li , S , Repo , P , Bao , Y , Putkonen , M & Savin , H 2013 , ' Ozone-based batch atomic layer deposited Al2O3 for effective surface passivation ' , Energy Procedia , vol. 38 , pp. 890-894 . https://doi.org/10.1016/j.egypro.2013.07.361en
dc.identifier.doi10.1016/j.egypro.2013.07.361
dc.identifier.issn1876-6102
dc.identifier.otherPURE UUID: 58cd5fdd-a48c-43f0-85d5-26d3a90b0764
dc.identifier.otherPURE ITEMURL: https://research.aalto.fi/en/publications/58cd5fdd-a48c-43f0-85d5-26d3a90b0764
dc.identifier.otherPURE FILEURL: https://research.aalto.fi/files/11746845/1_s2.0_S1876610213014471_main.pdf
dc.identifier.urihttps://aaltodoc.aalto.fi/handle/123456789/25526
dc.identifier.urnURN:NBN:fi:aalto-201705113910
dc.language.isoenen
dc.relation.ispartofseriesENERGY PROCEDIAen
dc.relation.ispartofseriesVolume 38en
dc.rightsopenAccessen
dc.subject.keywordAtomic layer deposition
dc.subject.keywordozone
dc.subject.keywordaluminum oxide
dc.subject.keywordSi surface passivation
dc.titleOzone-based batch atomic layer deposited Al2O3 for effective surface passivationen
dc.typeA1 Alkuperäisartikkeli tieteellisessä aikakauslehdessäfi
dc.type.versionpublishedVersion
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