Electron beam lithography resists for nanoscience

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Journal Title
Journal ISSN
Volume Title
Kemiantekniikan korkeakoulu | Bachelor's thesis
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Author
Date
2023-06-12
Department
Major/Subject
Kemia ja materiaalitiede
Mcode
CHEM3049
Degree programme
Kemiantekniikan kandidaattiohjelma
Language
en
Pages
28
Series
Description
Supervisor
Kontturi, Eero
Thesis advisor
Meng, Lingju
Keywords
electron beam lithography, EBL, high-resolution, resist
Other note
Citation
Permanent link to this item
https://urn.fi/URN:NBN:fi:aalto-202308014663
Collections
[kand] Kemian tekniikan korkeakoulu / CHEM