Designing the vacuum chamber of ALD reactor
dc.contributor | Aalto-yliopisto | fi |
dc.contributor | Aalto University | en |
dc.contributor.advisor | Karjalainen, Veli-Matti | |
dc.contributor.author | Poutiainen, Juho | |
dc.contributor.department | Koneenrakennustekniikan laitos | fi |
dc.contributor.school | Teknillinen korkeakoulu | fi |
dc.contributor.school | Helsinki University of Technology | en |
dc.contributor.supervisor | Juhanko, Jari | |
dc.date.accessioned | 2020-12-05T14:34:24Z | |
dc.date.available | 2020-12-05T14:34:24Z | |
dc.date.issued | 2009 | |
dc.format.extent | (8) + 81 s. + liitt. | |
dc.identifier.uri | https://aaltodoc.aalto.fi/handle/123456789/96569 | |
dc.identifier.urn | URN:NBN:fi:aalto-2020120555403 | |
dc.language.iso | fi | en |
dc.programme.major | Koneensuunnitteluoppi | fi |
dc.programme.mcode | Kon-41 | fi |
dc.rights.accesslevel | closedAccess | |
dc.subject.keyword | thin-films | en |
dc.subject.keyword | ohutkalvopinnoitus | fi |
dc.subject.keyword | vacuum | en |
dc.subject.keyword | tyhjiötekniikka | fi |
dc.subject.keyword | Atomic layer deposition | en |
dc.subject.keyword | ALD | fi |
dc.title | Designing the vacuum chamber of ALD reactor | en |
dc.title | ALD-reaktorin vakuumikammion suunnittelu | fi |
dc.type.okm | G2 Pro gradu, diplomityö | |
dc.type.ontasot | Master's thesis | en |
dc.type.ontasot | Pro gradu -tutkielma | fi |
dc.type.publication | masterThesis | |
local.aalto.digiauth | ask | |
local.aalto.digifolder | Aalto_13045 | |
local.aalto.idinssi | 37756 | |
local.aalto.openaccess | no |