Growth and properties of compound semiconductors on germanium substrate

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dc.contributorAalto-yliopistofi
dc.contributorAalto Universityen
dc.contributor.authorKnuuttila, Lauri 
dc.contributor.departmentDepartment of Electrical and Communications Engineeringen
dc.contributor.departmentSähkö- ja tietoliikennetekniikan osastofi
dc.contributor.labOptoelectronics Laboratoryen
dc.contributor.labOptoelektroniikan laboratoriofi
dc.date.accessioned2012-02-17T07:39:49Z
dc.date.available2012-02-17T07:39:49Z
dc.date.issued2006-05-05 
dc.description.abstractThe aim of this thesis is to investigate the growth and characterisation of compound semiconductors on germanium (Ge) substrates. Also properties of detector applications and novel Ga(In)NAs compounds are presented on Ge substrates. The epitaxial growth is performed using metalorganic vapour phase epitaxy (MOVPE) technique. The nucleation of zinc blende lattice compound semiconductors on the surface of diamond lattice Ge are highly affected by different growth conditions such as temperature, growth rate and partial pressure of source materials. Thus, thorough characterisation of the fabricated structures and optimisation of the growth parameters are required. Three-dimensional island formation was observed for initial growth phases of GaAs and In(Ga)As on Ge. The properties of the self-assembled islands were investigated using atomic force microscopy (AFM). In0.5Ga0.5As islands grown at low temperature of 550° C showed a high areal density of 3.5 × 1010 cm−2 and uniformity in size. For grown GaAs layers the high initial island density and uniformity enables homogeneous coalescence of the islands as the growth is continued and results in smooth two-dimensional GaAs surfaces already at small layer thicknesses. The crystal and optical properties of GaAs and Ga(In)NAs layers were investigated using high resolution X-ray diffraction (HRXRD), synchrotron X-ray topography (SXT) and photoluminescence (PL). In SXT measurements a 650 nm thick GaAs layer grown on Ge showed very small dislocation density of 250–500 cm−2. The value is better than was found by SXT for the vapour pressure controlled Czochralski (VCz) grown GaAs substrates. The growth of GaAs on misoriented Ge substrate results in a tilt angle between the lattice planes of the substrate and the layer. For these structures it was shown that a specific HRXRD setup, in which the diffraction plane is parallel with the step edges on the Ge surface, enables accurate measurements and analyses of the structures. From a GaInNAs multi-quantum well structure on Ge photoluminescence at telecommunication wavelength of 1.55 µm was obtained. From the HRXRD and PL results a nitrogen incorporation of about 5 % was determined for the quantum wells. Also for a GaAs/Ge matrix detector structure a record low leakage current of 3 × 10−9 A/cm2 was obtained at 77 K. From arsenic diffusion based matrix detector fabricated on Ge substrate an excellent resolution of 220 eV at 5.9 keV and 400 eV at 60 keV was measured.en
dc.description.versionrevieweden
dc.format.extent57, [39] 
dc.format.mimetypeapplication/pdf 
dc.identifier.isbn951-22-8110-4 
dc.identifier.urihttps://aaltodoc.aalto.fi/handle/123456789/2694
dc.identifier.urnurn:nbn:fi:tkk-006814 
dc.language.isoenen
dc.publisherHelsinki University of Technologyen
dc.publisherTeknillinen korkeakoulufi
dc.relation.haspartL. Knuuttila, A. Lankinen, J. Likonen, H. Lipsanen, X. Lu, P. McNally, J. Riikonen, and T. Tuomi, Low Temperature Growth GaAs on Ge, Japanese Journal of Applied Physics 44, 7777-7784 (2005). 
dc.relation.haspartL. Knuuttila, K. Kainu, M. Sopanen, and H. Lipsanen, In(Ga)As quantum dots on Ge substrate, Journal of Materials Science: Materials in Electronics 14, 349-352 (2003). 
dc.relation.haspartL. Knuuttila, T. Korkala, M. Sopanen, and H. Lipsanen, Self-assembled In(Ga)As islands on Ge substrate, Journal of Crystal Growth 272, 221-226 (2004). 
dc.relation.haspartT. Tuomi, L. Knuuttila, J. Riikonen, P. McNally, W. Chen, J. Kanatharana, M. Neubert, and P. Rudolph, Synchrotron X-ray topography of undoped VCz GaAs crystals, Journal of Crystal Growth 237-239, 350-355 (2002). 
dc.relation.haspartA. Lankinen, L. Knuuttila, T. Tuomi, P. Kostamo, A. Säynätjoki, J. Riikonen, H. Lipsanen, P. McNally, X. Lu, H. Sipilä, S. Vaijärvi, and D. Lumb, Synchrotron X-ray topography study of defects in epitaxial GaAs on high-quality Ge, Nuclear Instruments and Methods in Physics Research A, accepted for publication, 4 pages. 
dc.relation.haspartJ. Toivonen, T. Tuomi, J. Riikonen, L. Knuuttila, T. Hakkarainen, M. Sopanen, H. Lipsanen, P. McNally, W. Chen, and D. Lowney, Misfit dislocations in GaAsN/GaAs interface, Journal of Materials Science: Materials in Electronics 14, 267-270 (2003). 
dc.relation.haspartL. Knuuttila, O. Reentilä, M. Mattila, and H. Lipsanen, Comparison of Ge and GaAs substrates for metalorganic vapor phase epitaxy of GaIn(N)As quantum wells, Japanese Journal of Applied Physics 44, L1475-L1477 (2005). 
dc.relation.haspartP. Kostamo, A. Säynätjoki, L. Knuuttila, H. Lipsanen, H. Andersson, K. Banzuzi, S. Nenonen, H. Sipilä, S. Vaijärvi, and D. Lumb, Ge/GaAs heterostructure matrix detector, Nuclear Instruments and Methods in Physics Research A, accepted for publication, 4 pages. 
dc.subject.keywordGe substrateen
dc.subject.keywordGaAsen
dc.subject.keywordGaInNAsen
dc.subject.keywordInAsen
dc.subject.keywordquantum wellen
dc.subject.keywordquantum doten
dc.subject.keywordcompound semiconductoren
dc.subject.otherElectrical engineeringen
dc.titleGrowth and properties of compound semiconductors on germanium substrateen
dc.typeG5 Artikkeliväitöskirjafi
dc.type.dcmitypetexten
dc.type.ontasotVäitöskirja (artikkeli)fi
dc.type.ontasotDoctoral dissertation (article-based)en
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