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Aluminum oxide hard mask fabrication by focused ion beam implantation and wet etching

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dc.contributor Aalto-yliopisto fi
dc.contributor Aalto University en
dc.contributor.advisor Chekurov, Nikolai
dc.contributor.author Liu, Zhengjun
dc.date.accessioned 2012-12-21T08:35:34Z
dc.date.available 2012-12-21T08:35:34Z
dc.date.issued 2012
dc.identifier.uri https://aaltodoc.aalto.fi/handle/123456789/7274
dc.description.abstract A novel aluminum oxide (Al2O3) hard mask fabrication process with nanoscale resolution is introduced in this work. The Al2O3 mask can be used for various purposes, and in this thesis it was utilized for silicon patterning using cryogenic deep reactive ion etching (DRIE). Patterning of Al2O3 is a two-step process utilizing focused ion beam (FIB) irradiation combined with wet etching. Ga+ FIB maskless patterning renders wet etch selectivity between the irradiated region and the non-irradiated region on the Al2O3 layer, and mask patterns can be easily revealed by wet etching. This method is a modification of direct Ga+ FIB implantation for silicon etch stop. Introducing an Al2O3 layer eliminates the lattice damage and doping to silicon substrate in critical devices, as an extra film protects the underlying silicon from Ga+ ions. Masking capacity is evaluated in terms of equal width line and space pairs amount per 1 µm in a nano-line array. 7 pairs per 1 µm is achieved in this work. en
dc.format.extent [7] + 70 s.
dc.format.mimetype application/pdf
dc.language.iso en en
dc.title Aluminum oxide hard mask fabrication by focused ion beam implantation and wet etching en
dc.type G2 Pro gradu, diplomityö fi
dc.contributor.school Sähkötekniikan korkeakoulu fi
dc.contributor.department Mikro- ja nanotekniikan laitos fi
dc.subject.keyword FIB en
dc.subject.keyword photoresist-free en
dc.subject.keyword aluminum oxide en
dc.subject.keyword hard mask en
dc.subject.keyword cryogenic DRIE en
dc.subject.keyword nanofabrication en
dc.identifier.urn URN:NBN:fi:aalto-201305163108
dc.type.dcmitype text en
dc.programme.major Optiikka ja molekyylimateriaalit fi
dc.programme.mcode S-129
dc.type.ontasot Diplomityö fi
dc.type.ontasot Master's thesis en
dc.contributor.supervisor Tittonen, Ilkka
dc.location P1 fi
local.aalto.openaccess yes
local.aalto.digifolder Aalto_05302
dc.rights.accesslevel openAccess
local.aalto.idinssi 45716
dc.type.publication masterThesis
dc.type.okm G2 Pro gradu, diplomityö


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