Sticking probabilities of H 2 O and Al(CH 3 ) 3 during atomic layer deposition of Al 2 O 3 extracted from their impact on film conformality

 |  Login

Files in this item

Files Size Format View

There are no files associated with this item.

This item appears in the following Collection(s)

Search archive


Advanced Search

article-iconSubmit a publication

Browse

My Account