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Atomic/Molecular Layer Deposition of s-Block Metal Carboxylate Coordination Network Thin Films

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dc.contributor Aalto-yliopisto fi
dc.contributor Aalto University en
dc.contributor.author Penttinen, Jenna
dc.contributor.author Nisula, Mikko
dc.contributor.author Karppinen, Maarit
dc.date.accessioned 2019-04-02T06:52:52Z
dc.date.available 2019-04-02T06:52:52Z
dc.date.issued 2017-12
dc.identifier.citation Penttinen , J , Nisula , M & Karppinen , M 2017 , ' Atomic/Molecular Layer Deposition of s-Block Metal Carboxylate Coordination Network Thin Films ' , Chemistry - A European Journal , vol. 23 , no. 72 , pp. 18225-18231 . https://doi.org/10.1002/chem.201703704 en
dc.identifier.issn 0947-6539
dc.identifier.issn 1521-3765
dc.identifier.other PURE UUID: 3316bde8-3c3f-461a-95c8-5422e5d02fae
dc.identifier.other PURE ITEMURL: https://research.aalto.fi/en/publications/atomicmolecular-layer-deposition-of-sblock-metal-carboxylate-coordination-network-thin-films(3316bde8-3c3f-461a-95c8-5422e5d02fae).html
dc.identifier.other PURE LINK: http://www.scopus.com/inward/record.url?scp=85036515722&partnerID=8YFLogxK
dc.identifier.other PURE FILEURL: https://research.aalto.fi/files/32492155/2017_Atomic_Molecular_Layer_Deposition_Metal_ChemEurJ_Penttinen_accepted.pdf
dc.identifier.uri https://aaltodoc.aalto.fi/handle/123456789/37283
dc.description | openaire: EC/FP7/339478/EU//LAYERENG-HYBMAT
dc.description.abstract We present novel atomic/molecular layer deposition (ALD/MLD) processes for the fabrication of crystalline inorganic-organic coordination network thin films with different s-block elements. Terephthalic acid is employed as the organic precursor. Such thin films could enable for example, next-generation battery, sensor and gas-storage technologies. The deposition processes fulfill the basic principles of ALD/MLD-type growth including the sequential self-saturated gas-surface reactions and atomic/molecular-level control for the film thickness, and yield crystalline thin films in a wide deposition temperature range. Structural characterization of the films is performed by grazing incidence X-ray diffraction (GIXRD) and Fourier-transform infrared (FTIR) spectroscopy. The data do not unambiguously prove but also do not rule out the crystal structures previously reported for the corresponding bulk samples. We moreover demonstrate the growth of crystalline thin films of a new terephthalate material with La as the metal component. Upon humidity treatments the Li, Na, K, Ba, and La terephthalate films remain unaffected while the Mg, Ca, and Sr terephthalate films reversibly absorb water molecules forming well-defined crystalline water-derivative phases. en
dc.format.extent 18225-18231
dc.format.mimetype application/pdf
dc.language.iso en en
dc.publisher WILEY-V C H VERLAG GMBH
dc.relation info:eu-repo/grantAgreement/EC/FP7/339478/EU//LAYERENG-HYBMAT
dc.relation.ispartofseries Chemistry - A European Journal en
dc.relation.ispartofseries Volume 23, issue 72 en
dc.rights openAccess en
dc.title Atomic/Molecular Layer Deposition of s-Block Metal Carboxylate Coordination Network Thin Films en
dc.type A1 Alkuperäisartikkeli tieteellisessä aikakauslehdessä fi
dc.description.version Peer reviewed en
dc.contributor.department Department of Chemistry and Materials Science
dc.subject.keyword Atomic layer deposition
dc.subject.keyword Coordination network structures
dc.subject.keyword Inorganic-organic hybrids
dc.subject.keyword Molecular layer deposition
dc.subject.keyword Thin films
dc.identifier.urn URN:NBN:fi:aalto-201904022414
dc.identifier.doi 10.1002/chem.201703704
dc.date.embargo info:eu-repo/date/embargoEnd/2019-10-19


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