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Characterization and electrochemical properties of iron-doped tetrahedral amorphous carbon (ta-C) thin films

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dc.contributor Aalto-yliopisto fi
dc.contributor Aalto University en
dc.contributor.author Etula, Jarkko
dc.contributor.author Wester, Niklas
dc.contributor.author Sainio, Sami
dc.contributor.author Laurila, Tomi
dc.contributor.author Koskinen, Jari
dc.date.accessioned 2018-09-04T11:13:28Z
dc.date.available 2018-09-04T11:13:28Z
dc.date.issued 2018-01-01
dc.identifier.citation Etula , J , Wester , N , Sainio , S , Laurila , T & Koskinen , J 2018 , ' Characterization and electrochemical properties of iron-doped tetrahedral amorphous carbon (ta-C) thin films ' , RSC Advances , vol. 8 , no. 46 , pp. 26356-26363 . https://doi.org/10.1039/c8ra04719g en
dc.identifier.issn 2046-2069
dc.identifier.other PURE UUID: 5d23c50c-efd4-4c05-bfb7-8f8b5b8e85b9
dc.identifier.other PURE ITEMURL: https://research.aalto.fi/en/publications/5d23c50c-efd4-4c05-bfb7-8f8b5b8e85b9
dc.identifier.other PURE LINK: http://www.scopus.com/inward/record.url?scp=85050341624&partnerID=8YFLogxK
dc.identifier.other PURE FILEURL: https://research.aalto.fi/files/27527537/CHEM_Etula_etal_Characterization_and_electrochemical_RSC_Advances_8_26356_2018.pdf
dc.identifier.uri https://aaltodoc.aalto.fi/handle/123456789/33808
dc.description Electronic supplementary information (ESI) available: Deposition method calibration data, XRR details, additional XPS data, TEM images, CV curves, calculated CV rate constants. See DOI: 10.1039/c8ra04719g
dc.description.abstract Iron-doped tetrahedral amorphous carbon thin films (Fe/ta-C) were deposited with varying iron content using a pulsed filtered cathodic vacuum arc system (p-FCVA). The aim of this study was to understand effects of iron on both the physical and electrochemical properties of the otherwise inert sp3-rich ta-C matrix. As indicated by X-ray photoelectron spectroscopy (XPS), even ∼0.4 at% surface iron had a profound electrochemical impact on both the potential window of ta-C in H2SO4 and KOH, as well as pseudocapacitance. It also substantially enhanced the electron transport and re-enabled facile outer sphere redox reaction kinetics in comparison to un-doped ta-C, as measured with electrochemical impedance spectroscopy (EIS) and cyclic voltammetry (CV) using outer-sphere probes Ru(NH3)6, IrCl6, and FcMeOH. These increases in surface iron loading were linked to increased surface oxygen content and iron oxides. Unlike few other metals, an iron content even up to 10 at% was not found to result in the formation of sp2-rich amorphous carbon films as investigated by Raman spectroscopy. Atomic force microscopy (AFM) and transmission electron microscopy (TEM) investigations found all films to be amorphous and ultrasmooth with Rq values always in the range of 0.1-0.2 nm. As even very small amounts of Fe were shown to dominate the electrochemistry of ta-C, implications of this study are very useful e.g. in carbon nanostructure synthesis, where irregular traces of iron can be readily incorporated into the final structures. en
dc.format.extent 8
dc.format.extent 26356-26363
dc.format.mimetype application/pdf
dc.language.iso en en
dc.relation.ispartofseries RSC Advances en
dc.relation.ispartofseries Volume 8, issue 46 en
dc.rights openAccess en
dc.title Characterization and electrochemical properties of iron-doped tetrahedral amorphous carbon (ta-C) thin films en
dc.type A1 Alkuperäisartikkeli tieteellisessä aikakauslehdessä fi
dc.description.version Peer reviewed en
dc.contributor.department Physical Characteristics of Surfaces and Interfaces
dc.contributor.department Department of Chemistry
dc.contributor.department Department of Electrical Engineering and Automation
dc.contributor.department Department of Chemistry and Materials Science en
dc.identifier.urn URN:NBN:fi:aalto-201809044928
dc.identifier.doi 10.1039/c8ra04719g
dc.type.version publishedVersion

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