Effect of substrate pretreatments on the atomic layer deposited Al2O3 passivation quality

Bao, Yameng; Li, Shuo; von Gastrow, Guillaume; Repo, Päivikki; Putkonen, Matti; Savin, Hele

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Effect of substrate pretreatments on the atomic layer deposited Al2O3 passivation quality

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Title:	Effect of substrate pretreatments on the atomic layer deposited Al2O3 passivation quality
Author(s):	Bao, Yameng ; Li, Shuo ; von Gastrow, Guillaume ; Repo, Päivikki ; Putkonen, Matti ; Savin, Hele
Date:	2015
Language:	en
Pages:	4
Department:	Department of Micro and Nanosciences School services, ELEC Hele Savin Group
Series:	JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A, Volume 33, issue 1
ISSN:	0734-2101 1520-8559
DOI-number:	10.1116/1.4901456
Subject:	213 Electronic, automation and communications engineering, electronics, 216 Materials engineering, 221 Nanotechnology, 114 Physical sciences, 116 Chemical sciences, 318 Medical biotechnology
Keywords:	213 Electronic, automation and communications engineering, electronics, 216 Materials engineering, 221 Nanotechnology, 114 Physical sciences, 116 Chemical sciences, 318 Medical biotechnology
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Citation: Bao , Y , Li , S , von Gastrow , G , Repo , P , Putkonen , M & Savin , H 2015 , ' Effect of substrate pretreatments on the atomic layer deposited Al2O3 passivation quality ' JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A , vol 33 , no. 1 , 01A123 . DOI: 10.1116/1.4901456

Description: VK: T40310
Permanent link to this item: http://urn.fi/URN:NBN:fi:aalto-201808014106 Email this Export to RefWorks QR Code Print BibTex Tweet