Tribological properties of thin films made by atomic layer deposition sliding against silicon

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dc.contributor Aalto-yliopisto fi
dc.contributor Aalto University en
dc.contributor.author Kilpi, Lauri
dc.contributor.author Ylivaara, Oili M.E.
dc.contributor.author Vaajoki, Antti
dc.contributor.author Liu, Xuwen
dc.contributor.author Rontu, Ville
dc.contributor.author Sintonen, Sakari
dc.contributor.author Haimi, Eero
dc.contributor.author Malm, Jari
dc.contributor.author Bosund, Markus
dc.contributor.author Tuominen, Marko
dc.contributor.author Sajavaara, Timo
dc.contributor.author Lipsanen, Harri
dc.contributor.author Hannula, Simo Pekka
dc.contributor.author Puurunen, Riikka L.
dc.contributor.author Ronkainen, Helena
dc.date.accessioned 2018-08-01T12:38:28Z
dc.date.available 2018-08-01T12:38:28Z
dc.date.issued 2018-01-01
dc.identifier.citation Kilpi , L , Ylivaara , O M E , Vaajoki , A , Liu , X , Rontu , V , Sintonen , S , Haimi , E , Malm , J , Bosund , M , Tuominen , M , Sajavaara , T , Lipsanen , H , Hannula , S P , Puurunen , R L & Ronkainen , H 2018 , ' Tribological properties of thin films made by atomic layer deposition sliding against silicon ' Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films , vol 36 , no. 1 , 01A122 . DOI: 10.1116/1.5003729 en
dc.identifier.issn 0734-2101
dc.identifier.issn 1520-8559
dc.identifier.other PURE UUID: 18165c57-ed36-4094-89e9-117b12f0584f
dc.identifier.other PURE ITEMURL: https://research.aalto.fi/en/publications/tribological-properties-of-thin-films-made-by-atomic-layer-deposition-sliding-against-silicon(18165c57-ed36-4094-89e9-117b12f0584f).html
dc.identifier.other PURE LINK: http://www.scopus.com/inward/record.url?scp=85040109619&partnerID=8YFLogxK
dc.identifier.other PURE FILEURL: https://research.aalto.fi/files/26703741/1.5003729.pdf
dc.identifier.uri https://aaltodoc.aalto.fi/handle/123456789/32681
dc.description.abstract Interfacial phenomena, such as adhesion, friction, and wear, can dominate the performance and reliability of microelectromechanical (MEMS) devices. Here, thin films made by atomic layer deposition (ALD) were tested for their tribological properties. Tribological tests were carried out with silicon counterpart sliding against ALD thin films in order to simulate the contacts occurring in the MEMS devices. The counterpart was sliding in a linear reciprocating motion against the ALD films with the total sliding distances of 5 and 20 m. Al2O3 and TiO2 coatings with different deposition temperatures were investigated in addition to Al2O3-TiO2-nanolaminate, TiN, NbN, TiAlCN, a-C:H [diamondlike carbon (DLC)] coatings, and uncoated Si. The formation of the tribolayer in the contact area was the dominating phenomenon for friction and wear performance. Hardness, elastic modulus, and crystallinity of the materials were also investigated. The nitride coatings had the most favorable friction and wear performance of the ALDcoatings, yet lower friction coefficient was measured with DLC a-C:H coating. These results help us to take steps toward improved coating solutions in, e.g., MEMS applications. en
dc.format.extent 13
dc.format.mimetype application/pdf
dc.language.iso en en
dc.relation.ispartofseries Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films en
dc.relation.ispartofseries Volume 36, issue 1 en
dc.rights openAccess en
dc.subject.other Condensed Matter Physics en
dc.subject.other Surfaces and Interfaces en
dc.subject.other Surfaces, Coatings and Films en
dc.subject.other 216 Materials engineering en
dc.title Tribological properties of thin films made by atomic layer deposition sliding against silicon en
dc.type A1 Alkuperäisartikkeli tieteellisessä aikakauslehdessä fi
dc.description.version Peer reviewed en
dc.contributor.department VTT Technical Research Centre of Finland
dc.contributor.department School common, ELEC
dc.contributor.department School services, CHEM
dc.contributor.department Department of Chemistry and Materials Science
dc.contributor.department School services, ELEC
dc.contributor.department Beneq Oy
dc.contributor.department ASM Microchemistry Oy
dc.contributor.department University of Jyväskylä
dc.contributor.department Department of Electronics and Nanoengineering
dc.contributor.department Department of Chemical and Metallurgical Engineering
dc.subject.keyword Condensed Matter Physics
dc.subject.keyword Surfaces and Interfaces
dc.subject.keyword Surfaces, Coatings and Films
dc.subject.keyword 216 Materials engineering
dc.identifier.urn URN:NBN:fi:aalto-201808014081
dc.identifier.doi 10.1116/1.5003729
dc.date.embargo info:eu-repo/date/embargoEnd/2019-01-01


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