Citation:
Mai , L , Giedraityte , Z , Schmidt , M , Rogalla , D , Scholz , S , Wieck , A D , Devi , A & Karppinen , M 2017 , ' Atomic/molecular layer deposition of hybrid inorganic–organic thin films from erbium guanidinate precursor ' , Journal of Materials Science , vol. 52 , no. 11 , pp. 6216-6224 . https://doi.org/10.1007/s10853-017-0855-6
|
Abstract:
Luminescent erbium-based inorganic–organic hybrid materials play an important role in many frontier nano-sized applications, such as amplifiers, detectors and OLEDs. Here, we demonstrate the possibility to fabricate high-quality thin films comprising both erbium and an appropriate organic molecule as a luminescence sensitizer utilizing the combined atomic layer deposition and molecular layer deposition (ALD/MLD) technique. We employ tris(N,N′-diisopropyl-2-dimethylamido guanidinato)erbium(III) [Er(DPDMG)3] together with 3,5-pyridine dicarboxylic acid as precursors. With the appreciably high film deposition rate achieved (6.4 Å cycle−1), the guanidinate precursor indeed appears as an interesting new addition to the ALD/MLD precursor variety toward novel materials. Our erbium–organic thin films showed highly promising UV absorption properties and a photoluminescence at 1535 nm for a 325-nm excitation, relevant to possible future luminescence applications.
|