Numerical study on the fluid dynamical aspects of atomic layer deposition process

 |  Login

Show simple item record

dc.contributor Aalto-yliopisto fi
dc.contributor Aalto University en
dc.contributor.author Peltonen, Petteri
dc.contributor.author Vuorinen, Ville
dc.contributor.author Marin, Giovanni
dc.contributor.author Karttunen, Antti J.
dc.contributor.author Karppinen, Maarit
dc.date.accessioned 2018-06-18T09:19:22Z
dc.date.available 2018-06-18T09:19:22Z
dc.date.issued 2018-03-01
dc.identifier.citation Peltonen , P , Vuorinen , V , Marin , G , Karttunen , A J & Karppinen , M 2018 , ' Numerical study on the fluid dynamical aspects of atomic layer deposition process ' Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films , vol 36 , no. 2 , 021516 . DOI: 10.1116/1.5018475 en
dc.identifier.issn 0734-2101
dc.identifier.issn 1520-8559
dc.identifier.other PURE UUID: 5aef2199-bebf-43c7-94b3-6fa93eaad909
dc.identifier.other PURE ITEMURL: https://research.aalto.fi/en/publications/numerical-study-on-the-fluid-dynamical-aspects-of-atomic-layer-deposition-process(5aef2199-bebf-43c7-94b3-6fa93eaad909).html
dc.identifier.other PURE LINK: http://www.scopus.com/inward/record.url?scp=85042617744&partnerID=8YFLogxK
dc.identifier.other PURE FILEURL: https://research.aalto.fi/files/21135493/Numerical_study_on_the_fluid_dynamical_aspects_of_atomic_layer_deposition_process.pdf
dc.identifier.uri https://aaltodoc.aalto.fi/handle/123456789/31907
dc.description.abstract Computational fluid dynamics investigations on the mixing process of gases inside an atomic layer deposition (ALD) reactor are carried out. A test case involving a real ALD reactor geometry is investigated under nonreacting, incompressible flow assumption. The relatively low Reynolds number (Re) of the test reactor, often being in the laminar regime, advocates the usage of scale-resolving simulations. The authors investigate mixing of two precursors in two different injection configurations for 40 < Re < 2400. The feasibility of the approach is shown and discussed. The results illustrate how both Reynolds number and injection configurations influence the precursor distribution in the ALD reactor. The authors also carry out a set of experiments in the same ALD reactor and discuss them in light of the simulations. en
dc.format.extent 11
dc.format.mimetype application/pdf
dc.language.iso en en
dc.relation.ispartofseries Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films en
dc.relation.ispartofseries Volume 36, issue 2 en
dc.rights openAccess en
dc.subject.other Condensed Matter Physics en
dc.subject.other Surfaces and Interfaces en
dc.subject.other Surfaces, Coatings and Films en
dc.subject.other 214 Mechanical engineering en
dc.subject.other 116 Chemical sciences en
dc.title Numerical study on the fluid dynamical aspects of atomic layer deposition process en
dc.type A1 Alkuperäisartikkeli tieteellisessä aikakauslehdessä fi
dc.description.version Peer reviewed en
dc.contributor.department Department of Mechanical Engineering
dc.contributor.department Department of Chemistry and Materials Science
dc.subject.keyword Condensed Matter Physics
dc.subject.keyword Surfaces and Interfaces
dc.subject.keyword Surfaces, Coatings and Films
dc.subject.keyword 214 Mechanical engineering
dc.subject.keyword 116 Chemical sciences
dc.identifier.urn URN:NBN:fi:aalto-201806183325
dc.identifier.doi 10.1116/1.5018475
dc.date.embargo info:eu-repo/date/embargoEnd/2019-03-01


Files in this item

Files Size Format View

There are no files associated with this item.

This item appears in the following Collection(s)

Show simple item record

Search archive


Advanced Search

article-iconSubmit a publication

Browse

My Account