ALD thin films into high aspect ratio structures

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dc.contributor Aalto-yliopisto fi
dc.contributor Aalto University en
dc.contributor.advisor Franssila, Sami
dc.contributor.author Ranta, Anton
dc.date.accessioned 2017-10-24T09:10:56Z
dc.date.available 2017-10-24T09:10:56Z
dc.date.issued 2017-09-15
dc.identifier.uri https://aaltodoc.aalto.fi/handle/123456789/28422
dc.format.extent 33
dc.format.mimetype application/pdf en
dc.language.iso en en
dc.title ALD thin films into high aspect ratio structures en
dc.type G1 Kandidaatintyö fi
dc.contributor.school Kemiantekniikan korkeakoulu fi
dc.subject.keyword atomic layer deposition en
dc.subject.keyword aspect ratio en
dc.subject.keyword sticking coefficient en
dc.identifier.urn URN:NBN:fi:aalto-201710247270
dc.type.dcmitype text en
dc.programme.major Materiaalitiede ja -tekniikka fi
dc.programme.mcode CHEM3013 fi
dc.type.ontasot Bachelor's thesis en
dc.type.ontasot Kandidaatintyö fi
dc.contributor.supervisor Fabricius, Gunilla
dc.programme Kemiantekniikan kandidaattiohjelma fi


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