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Atomic layer deposition of nickel–cobalt spinel thin films

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dc.contributor Aalto-yliopisto fi
dc.contributor Aalto University en
dc.contributor.author Hagen, Dirk
dc.contributor.author Tripathi, Tripurari
dc.contributor.author Karppinen, Maarit
dc.date.accessioned 2017-05-11T08:35:54Z
dc.date.available 2017-05-11T08:35:54Z
dc.date.issued 2017
dc.identifier.citation Hagen , D , Tripathi , T & Karppinen , M 2017 , ' Atomic layer deposition of nickel–cobalt spinel thin films ' , Dalton Transactions , vol. 46 , no. 14 , pp. 4796-4805 . https://doi.org/10.1039/C7DT00512A en
dc.identifier.issn 1477-9226
dc.identifier.issn 1477-9234
dc.identifier.other PURE UUID: 83e7ddc8-68ce-44f8-9e2d-c93775d871c3
dc.identifier.other PURE ITEMURL: https://research.aalto.fi/en/publications/atomic-layer-deposition-of-nickelcobalt-spinel-thin-films(83e7ddc8-68ce-44f8-9e2d-c93775d871c3).html
dc.identifier.other PURE FILEURL: https://research.aalto.fi/files/11440981/ERC_32_accepted.pdf
dc.identifier.uri https://aaltodoc.aalto.fi/handle/123456789/25662
dc.description The research leading to these results has received funding from the European Research Council under the European Union's Seventh Framework Programme (FP/2007-2013) / ERC Grant Agreement n. 339478. Acronym LAYERENG-HYBMAT. | openaire: EC/FP7/339478/EU//LAYERENG-HYBMAT
dc.description.abstract We report the atomic layer deposition (ALD) of high-quality crystalline thin films of the spinel-oxide system (Co1−xNix)3O4. These spinel oxides are ferrimagnetic p-type semiconductors, and promising material candidates for several applications ranging from photovoltaics and spintronics to thermoelectrics. The spinel phase is obtained for Ni contents exceeding the x = 0.33 limit for bulk samples. It is observed that the electrical resistivity decreases continuously with x while the magnetic moment increases up to x = 0.5. This is in contrast to bulk samples where a decrease of resistivity is not observed for x > 0.33 due to the formation of a rock-salt phase. From UV-VIS-NIR absorption measurements, a change from distinct absorption edges for the parent oxide Co3O4 to a continuous absorption band ranging deep into the near infrared for 0 < x ≤ 0.5 was observed. The conformal deposition of dense films on high-aspect-ratio patterns is demonstrated. en
dc.format.extent 10
dc.format.mimetype application/pdf
dc.language.iso en en
dc.relation info:eu-repo/grantAgreement/EC/FP7/339478/EU//LAYERENG-HYBMAT
dc.relation.ispartofseries DALTON TRANSACTIONS en
dc.rights openAccess en
dc.title Atomic layer deposition of nickel–cobalt spinel thin films en
dc.type A1 Alkuperäisartikkeli tieteellisessä aikakauslehdessä fi
dc.description.version Peer reviewed en
dc.contributor.department Department of Chemistry and Materials Science
dc.identifier.urn URN:NBN:fi:aalto-201705114046
dc.identifier.doi 10.1039/C7DT00512A
dc.type.version acceptedVersion
dc.date.embargo info:eu-repo/date/embargoEnd/2017-03-18

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