Learning Centre

Ozone-based batch atomic layer deposited Al2O3 for effective surface passivation

 |  Login

Show simple item record

dc.contributor Aalto-yliopisto fi
dc.contributor Aalto University en
dc.contributor.author von Gastrow, Guillaume
dc.contributor.author Li, Shuo
dc.contributor.author Repo, Päivikki
dc.contributor.author Bao, Yameng
dc.contributor.author Putkonen, Matti
dc.contributor.author Savin, Hele
dc.date.accessioned 2017-05-11T07:16:26Z
dc.date.available 2017-05-11T07:16:26Z
dc.date.issued 2013
dc.identifier.citation von Gastrow , G , Li , S , Repo , P , Bao , Y , Putkonen , M & Savin , H 2013 , ' Ozone-based batch atomic layer deposited Al2O3 for effective surface passivation ' , Energy Procedia , vol. 38 , pp. 890-894 . https://doi.org/10.1016/j.egypro.2013.07.361 en
dc.identifier.issn 1876-6102
dc.identifier.other PURE UUID: 58cd5fdd-a48c-43f0-85d5-26d3a90b0764
dc.identifier.other PURE ITEMURL: https://research.aalto.fi/en/publications/58cd5fdd-a48c-43f0-85d5-26d3a90b0764
dc.identifier.other PURE FILEURL: https://research.aalto.fi/files/11746845/1_s2.0_S1876610213014471_main.pdf
dc.identifier.uri https://aaltodoc.aalto.fi/handle/123456789/25526
dc.description.abstract In this paper we compare water and ozone as oxidants in the Al2O3 ALD reaction in terms of surface passivation quality. The experiments show that O3 produces a high negative charge density up to 7-1012 cm−2 even in as-deposited film, which is different from water based Al2O3 that requires a separate annealing step to activate the negative charge. In general, the ozone process produces lower interface defect density (Dit) and higher negative charge density, which contributes to the higher lifetime value than corresponding water process. Most importantly, ozone-based Al2O3 shows much better firing stability than water-based Al2O3. Ozone concentration is also shown to play a role in the surface passivation quality. Finally, we found out that inserting a water pulse after the ozone pulse can lower the Dit further resulting in even higher lifetime. en
dc.format.extent 890-894
dc.format.mimetype application/pdf
dc.language.iso en en
dc.relation.ispartofseries ENERGY PROCEDIA en
dc.relation.ispartofseries Volume 38 en
dc.rights openAccess en
dc.title Ozone-based batch atomic layer deposited Al2O3 for effective surface passivation en
dc.type A1 Alkuperäisartikkeli tieteellisessä aikakauslehdessä fi
dc.description.version Peer reviewed en
dc.contributor.department VTT Technical Research Centre of Finland
dc.contributor.department Hele Savin Group
dc.contributor.department Department of Micro and Nanosciences en
dc.subject.keyword Atomic layer deposition
dc.subject.keyword ozone
dc.subject.keyword aluminum oxide
dc.subject.keyword Si surface passivation
dc.identifier.urn URN:NBN:fi:aalto-201705113910
dc.identifier.doi 10.1016/j.egypro.2013.07.361
dc.type.version publishedVersion

Files in this item

Files Size Format View

There are no open access files associated with this item.

This item appears in the following Collection(s)

Show simple item record

Search archive

Advanced Search

article-iconSubmit a publication