Analysis of the Atomic Layer Deposited Al2O3 field-effect passivation in black silicon

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Title:	Analysis of the Atomic Layer Deposited Al2O3 field-effect passivation in black silicon
Author(s):	von Gastrow, Guillaume ; Alcubilla, Ramon ; Ortega, Pablo ; Yli-Koski, Marko ; Conesa-Boj, Sònia ; Fontcuberta i Morral, Anna ; Savin, Hele
Date:	2015
Language:	en
Pages:	5 29-33
Department:	Hele Savin Group Department of Micro and Nanosciences
Series:	SOLAR ENERGY MATERIALS AND SOLAR CELLS, Volume 142
ISSN:	0927-0248
DOI-number:	10.1016/j.solmat.2015.05.027
Keywords:	Al2O3, atomic layer deposition, nano-texturing, negative charge, reactive ion etching, surface passivation
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Citation: von Gastrow , G , Alcubilla , R , Ortega , P , Yli-Koski , M , Conesa-Boj , S , Fontcuberta i Morral , A & Savin , H 2015 , ' Analysis of the Atomic Layer Deposited Al2O3 field-effect passivation in black silicon ' , Solar Energy Materials and Solar Cells , vol. 142 , pp. 29-33 . https://doi.org/10.1016/j.solmat.2015.05.027

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