Organic and inorganic–organic thin film structures by molecular layer deposition: A review

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dc.contributor Aalto-yliopisto fi
dc.contributor Aalto University en
dc.contributor.author Sundberg, Pia
dc.contributor.author Karppinen, Maarit
dc.date.accessioned 2015-10-14T09:01:59Z
dc.date.available 2015-10-14T09:01:59Z
dc.date.issued 2014
dc.identifier.citation Sundberg, Pia & Karppinen, Maarit. 2014. Organic and inorganic–organic thin film structures by molecular layer deposition: A review. Beilstein Journal of Nanotechnology. Volume 5. 1104-1136. ISSN 2190-4286 (printed). DOI: 10.3762/bjnano.5.123. en
dc.identifier.issn 2190-4286 (printed)
dc.identifier.uri https://aaltodoc.aalto.fi/handle/123456789/18021
dc.description.abstract The possibility to deposit purely organic and hybrid inorganic–organic materials in a way parallel to the state-of-the-art gas-phase deposition method of inorganic thin films, i.e., atomic layer deposition (ALD), is currently experiencing a strongly growing interest. Like ALD in case of the inorganics, the emerging molecular layer deposition (MLD) technique for organic constituents can be employed to fabricate high-quality thin films and coatings with thickness and composition control on the molecular scale, even on complex three-dimensional structures. Moreover, by combining the two techniques, ALD and MLD, fundamentally new types of inorganic–organic hybrid materials can be produced. In this review article, we first describe the basic concepts regarding the MLD and ALD/MLD processes, followed by a comprehensive review of the various precursors and precursor pairs so far employed in these processes. Finally, we discuss the first proof-of-concept experiments in which the newly developed MLD and ALD/MLD processes are exploited to fabricate novel multilayer and nanostructure architectures by combining different inorganic, organic and hybrid material layers into on-demand designed mixtures, superlattices and nanolaminates, and employing new innovative nanotemplates or post-deposition treatments to, e.g., selectively decompose parts of the structure. Such layer-engineered and/or nanostructured hybrid materials with exciting combinations of functional properties hold great promise for high-end technological applications. en
dc.format.extent 1104-1136
dc.format.mimetype application/pdf en
dc.language.iso en en
dc.publisher Beilstein Institut en
dc.relation info:eu-repo/grantAgreement/EC/FP7/339478/EU//LAYERENG-HYBMAT
dc.relation.ispartofseries Beilstein Journal of Nanotechnology en
dc.relation.ispartofseries Volume 5
dc.rights © 2014 Beilstein Institut. This is an Open Access article under the terms of the Creative Commons Attribution License (http://creativecommons.org/licenses/by/2.0), which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited. The license is subject to the Beilstein Journal of Nanotechnology terms and conditions: (http://www.beilstein-journals.org/bjnano)./articleFullText.htm?publicId=2190-4286-5-123. en
dc.subject.other Chemistry en
dc.title Organic and inorganic–organic thin film structures by molecular layer deposition: A review en
dc.type A1 Alkuperäisartikkeli tieteellisessä aikakauslehdessä fi
dc.description.version Peer reviewed en
dc.rights.holder Beilstein Institut
dc.contributor.school Kemian tekniikan korkeakoulu fi
dc.contributor.school School of Chemical Technology en
dc.contributor.department Kemian laitos fi
dc.contributor.department Department of Chemistry en
dc.subject.keyword atomic layer deposition (ALD) en
dc.subject.keyword hybrid inorganic–organic thin films en
dc.subject.keyword molecular layer deposition (MLD) en
dc.subject.keyword nanolaminates en
dc.subject.keyword nanostructuring en
dc.subject.keyword organic thin films en
dc.subject.keyword superlattices en
dc.subject.keyword thin-film technology en
dc.identifier.urn URN:NBN:fi:aalto-201510144609
dc.type.dcmitype text en
dc.identifier.doi 10.3762/bjnano.5.123
dc.type.version Final published version en


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