Citation:
Haarahiltunen, Antti & Varpula, Aapo & Savin, Hele. 2011. Modeling the effect of mobile ion contamination on the stability of a microelectromechanical resonator. Journal of Applied Physics. Volume 110, Issue 4. 0021-8979 (printed). DOI: 10.1063/1.3622511.
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