Inclined lithography and photoresist optimization for fabrication of 3D mesh structures

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dc.contributor Aalto-yliopisto fi
dc.contributor Aalto University en
dc.contributor.advisor Jokinen, Ville Marin, Giovanni 2014-12-29T12:39:27Z 2014-12-29T12:39:27Z 2014-12-15
dc.description.abstract The goal of this thesis was to fabricate 3D structures using SU-8 with a novel inclined exposure setup and process. The structures are 3D meshes whose final shape is dependent on both pattern on the photomask and SU-8 layer thickness. 3D structures were successfully fabricated on layers 100, 70 and 50 μm thick. Different patterns where tested to analyse the relations of the sizes and distribution of the holes in the mask with the final structures. SEM imaging confirmed the hypothesis that the shape of the 3D mesh is controlled by the pattern in the mask, the layer thickness and for a certain extent by the exposure dose. During the fabrication defects, caused by the behaviour of the resist during exposure, are observed in the structures. Most of the defects were eliminated or reduced in the optimized samples. The final structures fabricated had apertures in the mesh ranging from as small as 10 μm up to 40 μm and it was demonstrated that they can be fabricated inside microfluidic channels. Improvements to the process and potential applications are presented at the end of the thesis. en
dc.format.extent 80
dc.format.mimetype application/pdf en
dc.language.iso en en
dc.title Inclined lithography and photoresist optimization for fabrication of 3D mesh structures en
dc.type G2 Pro gradu, diplomityö en Sähkötekniikan korkeakoulu fi
dc.subject.keyword microfabrication en
dc.subject.keyword inclined lithography en
dc.subject.keyword 3D structures en
dc.subject.keyword mesh en
dc.subject.keyword photoresist en
dc.identifier.urn URN:NBN:fi:aalto-201412303346
dc.programme.major Micro and Nanotechnology fi
dc.programme.mcode S3010 fi
dc.type.ontasot Master's thesis en
dc.type.ontasot Diplomityö fi
dc.contributor.supervisor Franssila, Sami
dc.programme EST - Master’s Programme in Micro and Nanotechnology fi
dc.location P1 fi

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