Nanoporous Metal-Organic Framework Thin Films Prepared Directly from Gaseous Precursors by Atomic and Molecular Layer Deposition: Implications for Microelectronics

Multia, Jenna; Kravchenko, Dmitry E.; Rubio-Giménez, Víctor; Philip, Anish; Ameloot, Rob; Karppinen, Maarit

Aaltodoc
→
6b Artikkelit / Articles from Research information portal
→
[article-cris] Kemian tekniikan korkeakoulu / CHEM
→
View Item

Nanoporous Metal-Organic Framework Thin Films Prepared Directly from Gaseous Precursors by Atomic and Molecular Layer Deposition: Implications for Microelectronics

Altmetrics



Title:	Nanoporous Metal-Organic Framework Thin Films Prepared Directly from Gaseous Precursors by Atomic and Molecular Layer Deposition: Implications for Microelectronics
Author(s):	Multia, Jenna ; Kravchenko, Dmitry E. ; Rubio-Giménez, Víctor ; Philip, Anish ; Ameloot, Rob ; Karppinen, Maarit
Date:	2023-01-27
Language:	en
Pages:	5 827-831
Department:	School common, CHEM KU Leuven Department of Chemistry and Materials Science Department of Chemistry and Materials Science
Series:	ACS Applied Nano Materials, Volume 6, issue 2
ISSN:	2574-0970
DOI-number:	10.1021/acsanm.2c04934
Keywords:	atomic layer deposition, krypton physisorption, metal-organic framework, methanol physisorption, molecular layer deposition, porous thin films
» Show full item record
This publication is imported from Aalto University Research information portal: https://research.aalto.fi > View this publication in Research information portal > Other link related to publication (Research information portal) > View/Open full text file from Research information portal
Citation: Multia , J , Kravchenko , D E , Rubio-Giménez , V , Philip , A , Ameloot , R & Karppinen , M 2023 , ' Nanoporous Metal-Organic Framework Thin Films Prepared Directly from Gaseous Precursors by Atomic and Molecular Layer Deposition: Implications for Microelectronics ' , ACS Applied Nano Materials , vol. 6 , no. 2 , pp. 827-831 . https://doi.org/10.1021/acsanm.2c04934
Abstract: Atomic/molecular layer deposition (ALD/MLD) allows for the direct gas-phase synthesis of crystalline metal-organic framework (MOF) thin films. Here, we show for the first time using krypton and methanol physisorption measurements that ALD/MLD-fabricated copper 1,4-benzenedicarboxylate (Cu-BDC) ultrathin films possess accessible porosity matching that of the corresponding bulk MOF.

Description: Funding Information: This project has received funding from the European Union’s Horizon 2020 research and innovation program under Marie Skłodowska-Curie Grant Agreement 765378 and from Academy of Finland (PREIN). V.R.-G. thanks the Research Foundation Flanders for a Junior Postdoctoral Fellowship (1263622N). The research leading to this result has been supported by the project CALIPSOplus under Grant Agreement 730872 from the EU Framework Programme for Research and Innovation Horizon 2020. We acknowledge the use of the RawMatters Finland Infrastructure at Aalto University as well as Elettra Sincrotrone Trieste for providing access to its synchrotron radiation facilities (Proposal 20210538) and thank Luisa Barba and Nicola Demitri for assistance using beamline XRD1. We thank Prof. Roland Resel for assistance in using GIDVis software. Publisher Copyright: © 2023 The Authors. Published by American Chemical Society.
Permanent link to this item: http://urn.fi/URN:NBN:fi:aalto-202302202155 Email this Export to RefWorks QR Code Print BibTex Tweet