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Extreme-Ultraviolet Shaping and Imaging by High-Harmonic Generation from Nanostructured Silica

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dc.contributor Aalto-yliopisto fi
dc.contributor Aalto University en
dc.contributor.author Roscam Abbing, Sylvianne D.C.
dc.contributor.author Kolkowski, Radoslaw
dc.contributor.author Zhang, Zhuang Yan
dc.contributor.author Campi, Filippo
dc.contributor.author Lötgering, Lars
dc.contributor.author Koenderink, A. Femius
dc.contributor.author Kraus, Peter M.
dc.date.accessioned 2022-08-10T08:13:25Z
dc.date.available 2022-08-10T08:13:25Z
dc.date.issued 2022-06-03
dc.identifier.citation Roscam Abbing , S D C , Kolkowski , R , Zhang , Z Y , Campi , F , Lötgering , L , Koenderink , A F & Kraus , P M 2022 , ' Extreme-Ultraviolet Shaping and Imaging by High-Harmonic Generation from Nanostructured Silica ' , Physical Review Letters , vol. 128 , no. 22 , 223902 , pp. 1-7 . https://doi.org/10.1103/PhysRevLett.128.223902 en
dc.identifier.issn 0031-9007
dc.identifier.issn 1079-7114
dc.identifier.other PURE UUID: 04e7df86-64a8-4545-9034-b745201c6da6
dc.identifier.other PURE ITEMURL: https://research.aalto.fi/en/publications/04e7df86-64a8-4545-9034-b745201c6da6
dc.identifier.other PURE LINK: http://www.scopus.com/inward/record.url?scp=85131877644&partnerID=8YFLogxK
dc.identifier.other PURE FILEURL: https://research.aalto.fi/files/85959530/Extreme_Ultraviolet_Shaping_and_Imaging_by_High_Harmonic_Generation_from_Nanostructured_Silica.pdf
dc.identifier.uri https://aaltodoc.aalto.fi/handle/123456789/115660
dc.description Funding Information: Part of this work has been carried out at the Advanced Research Center for Nanolithography (ARCNL), a public-private partnership of the University of Amsterdam (UvA), the Vrije Universiteit Amsterdam (VU), the Dutch Research Council (NWO), and the semiconductor equipment manufacturer ASML, and was partly financed by Toeslag voor Topconsortia voor Kennis en Innovatie (TKI) from the Dutch Ministry of Economic Affairs and Climate Policy. We thank Reinout Jaarsma for technical support, and the mechanical workshop and the design, electronic, and software departments of ARCNL for support in constructing the setup. P. M. K. acknowledges support from NWO Veni Grant 016.Veni.192.254. Numerical simulations were performed at the research institute AMOLF, as part of the research programs Hybrid Nanophotonic Architectures for Ultrafast Quantum Optics (Project No. 680.47.621) and Nanophotonics for Solid-State Lighting (Project FOM-i33/680.93.33), both partly financed by NWO. Parts of the simulations were performed within the Aalto University School of Science Science-IT project, and were funded by the Academy of Finland Flagship Programme, Photonics Research and Innovation (PREIN), decision number: 320167. Publisher Copyright: © 2022 authors. Published by the American Physical Society.
dc.description.abstract Coherent extreme-ultraviolet pulses from high-harmonic generation have ample applications in attosecond science, lensless imaging, and industrial metrology. However, tailoring complex spatial amplitude, phase, and polarization properties of extreme-ultraviolet pulses is made nontrivial by the lack of efficient optical elements. Here, we have overcome this limitation through nanoengineered solid samples, which enable direct control over amplitude and phase patterns of nonlinearly generated extreme-ultraviolet pulses. We demonstrate experimental configurations and emitting structures that yield spatially patterned beam profiles, increased conversion efficiencies, and tailored polarization states. Furthermore, we use the emitted patterns to reconstruct height profiles, probe the near-field confinement in nanostructures below the diffraction limit of the fundamental radiation, and to image complex structures through coherent diffractive emission from these structures. Our results pave the way for introducing sub-fundamental-wavelength resolution imaging, direct manipulation of beams through nanoengineered samples, and metrology of nanostructures into the extreme-ultraviolet spectral range. en
dc.format.extent 7
dc.format.extent 1-7
dc.format.mimetype application/pdf
dc.language.iso en en
dc.publisher American Physical Society
dc.relation.ispartofseries Physical Review Letters en
dc.relation.ispartofseries Volume 128, issue 22 en
dc.rights openAccess en
dc.title Extreme-Ultraviolet Shaping and Imaging by High-Harmonic Generation from Nanostructured Silica en
dc.type A1 Alkuperäisartikkeli tieteellisessä aikakauslehdessä fi
dc.description.version Peer reviewed en
dc.contributor.department Optics and Photonics
dc.contributor.department AMOLF
dc.contributor.department Vrije Universiteit Amsterdam
dc.contributor.department Department of Applied Physics en
dc.identifier.urn URN:NBN:fi:aalto-202208104482
dc.identifier.doi 10.1103/PhysRevLett.128.223902
dc.type.version publishedVersion

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