Browsing by Author "Luchkin, Sergey"

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Adhesion of Single-Walled Carbon Nanotube Thin Films with Different Materials
(2020-01-16) M Rajanna, Pramod; Luchkin, Sergey; Larionov, Konstantin V.; Grebenko, Artem; Popov, Zakhar I.; Sorokin, Pavel B.; Danilson, Mati; Bereznev, Sergei; Lund, Peter D.; Nasibulin, Albert G.
A1 Alkuperäisartikkeli tieteellisessä aikakauslehdessä
Single-walled carbon nanotubes (SWCNTs) possess extraordinary physical and chemical properties. Thin films of randomly oriented SWCNTs have great potential in many opto-electro-mechanical applications. However, good adhesion of SWCNT films with a substrate material is pivotal for their practical use. Here, for the first time, we systematically investigate the adhesion properties of SWCNT thin films with commonly used substrates such as glass (SiO2), indium tin oxide (ITO), crystalline silicon (C-Si), amorphous silicon (a-Si:H), zirconium oxide (ZrO2), platinum (Pt), polydimethylsiloxane (PDMS), and SWCNTs for self-adhesion using atomic force microscopy. By comparing the results obtained in air and inert Ar atmospheres, we observed that the surface state of the materials greatly contributes to their adhesion properties. We found that the SWCNT thin films have stronger adhesion in an inert atmosphere. The adhesion in the air can be greatly improved by a fluorination process. Experimental and theoretical analyses suggest that adhesion depends on the atmospheric conditions and surface functionalization.
Green Lithography for Delicate Materials
(2021-07-02) Grebenko, Artem; Bubis, Anton; Motovilov, Konstantin; Dremov, Viacheslav; Korostylev, Evgeny; Kindiak, Ivan; Fedorov, Fedor S.; Luchkin, Sergey; Zhuikova, Yuliya; Trofimenko, Aleksandr; Filkov, Gleb; Sviridov, Georgiy; Ivanov, Andrey; Dull, Jordan T.; Mozhchil, Rais; Ionov, Andrey; Varlamov, Valery; Rand, Barry P.; Podzorov, Vitaly; Nasibulin, Albert G.
A1 Alkuperäisartikkeli tieteellisessä aikakauslehdessä
A variety of unconventional materials, including biological nanostructures, organic and hybrid semiconductors, as well as monolayer, and other low-dimensional systems, are actively explored. They are usually incompatible with standard lithographic techniques that use harsh organic solvents and other detrimental processing. Here, a new class of green and gentle lithographic resists, compatible with delicate materials and capable of both top-down and bottom-up fabrication routines is developed. To demonstrate the excellence of this approach, devices with sub-micron features are fabricated on organic semiconductor crystals and individual animal's brain microtubules. Such structures are created for the first time, thanks to the genuinely water-based lithography, which opens an avenue for the thorough research of unconventional delicate materials at the nanoscale.